Savannah – Atomic Layer Deposition System

Ultratech/CNT is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering comprehensive services and versatile, turnkey systems that are accessible, affordable and accurate to the atomic scale. Thin film deposition is our expertise. Our Savannah Series of thin film deposition tools exemplifies these competencies.

Savannah – Atomic Layer Deposition System

In stock

Savannah has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah’s efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.

  • In-Situ Ellipsometry
  • In-Situ QCM
  • Self Assembling Monolayers
  • 2-Second Cycle Times
  • Integrated Ozone
  • Low Vapor Pressure Deposition
  • Batch Processing
  • Glove Box Integration

Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah is available in three configurations: S100, S200, and S300. Savannah is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah is capable of handling gas, liquid, or solid precursors.

Substrate Size Savannah S100: up to 100 mm Savannah S200: up to 200 mm Savannah S300: up to 300 mm
Dimensions (w x d x h) Savannah S100: 585 x 560 x 980 mm Savannah S200: 585 x 560 x 980 mm Savannah S300: 686 x 560 x 980 mm
Cabinet Steel with white powder coat paint with removable panels and lockable precursor door
Operational Modes Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)
Power 115 VAC or 220 VAC,1500 W (excluding pump)
Controls LabVIEW™, Windows™ 7, Lenovo Laptop, USB control
Maximum Substrate Temperature S100: RT - 400 °C S200: RT - 350 °C S300: RT - 350 °C
Deposition Uniformity (Al2O3) <1% (1σ)
Cycle Time <2 seconds per cycle with Al2O3 at 200 °C
Vacuum Pump Alcatel 2021C2 – 14.6 CFM
Compatibility Clean room class 100 compatible
Compliance CE, TUV, FCC
Precursor Delivery System, Ports 2 lines standard, up to 6 lines available Each line accommodates solid, liquid and gas precursors Lines can be independently heated up to 200 °C
Precursor Delivery System, Valves Industry standard high speed ALD valves with 10 msec response time
Precursor Cylinders Individually heated 50 ml stainless steel cylinders, optional larger cylinders available
Carrier/Venting Gas N2 mass flow controlled, 100 SCCM
Options Low Vapor Pressure Delivery (LVPD) System Ozone Generator Dome lid for wafer cassette or 3D objects Glove box Interface In-Situ Ellipsometry In-Situ Quartz Crystal MicroBalance (QCM) Self Assembling Monolayers (SAMs) Particle Coating


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