The multi-purpose deposition system for Research & Development
Auto500 is a versatile front-loading coating system with box chamber for research & development or pre-production applications. The chamber accommodates large diameter substrates and allows a range of resistance evaporation, electron beam and sputter processes to be performed without breaking vacuum.
The front-loading chamber is mounted on a pedestal which also houses the vacuum system. A rugged PLC is used to control the vacuum while a full-height 19” equipment rack places the PLC screen and process accessory controls within easy reach of the operator.
The Auto500 can be configured with a single source or for multiple sources of different types to provide the user with great flexibility. The system can be upgraded with more or different accessories as requirements change.
The range of deposition sources is complemented by a range of work holders which provide for sample rotation, high-temperature heating and substrate bias.
A range of diffusion, turbo-molecular and cryo pumps is available to suit the widest range of requirements. Auto500 is also available with dry pumps for oil-free vacuum.