Savannah has become the preferred system for university researchers worldwide engaged in ALD and looking for an affordable yet robust platform. We have delivered hundreds of these systems in the past decade. Savannah’s efficient use of precursors and power-saving features substantially reduces the cost of operating a thin film deposition system.

• In-Situ Ellipsometry
• In-Situ QCM
• Self Assembling Monolayers
• 2-Second Cycle Times
• Integrated Ozone
• Low Vapor Pressure Deposition
• Batch Processing
• Glove Box Integration

Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah is available in three configurations: S100, S200, and S300. Savannah is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah is capable of handling gas, liquid, or solid precursors.