A compact footprint and innovative design, plus numerous automation options, makes the Phoenix the practical choice for those with batch production ALD requirements.
Key features include:
- Precise software control of process parameters, including temperature, flow and pressure, for defect-free coatings on even the most sensitive substrates
- Patented ALD Shield™ vapor trap to prevent build-up of deposits and minimizes excess process gases from being exhausted into the environment
- Large process chamber accepts GEN 2.5 substrates, multiple wafer cassettes and larger 3D objects
- Low cost of ownership with minimal startup and operational costs
- Compact footprint that conserves valuable clean room space
- Standard recipes and ALD materials readily available
- Comprehensive support and services worldwide from technical team and PhD scientists
- CE, FCC, and CSA compliant with many built-in safety features
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